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TOK global share, EUV photoresists

TOK global share, EUV photoresists, %, 2025 to 2025. Every value is listed in the table below.
PeriodValueSource
2025SourcedTokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field · 2025Open the source → %Tokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field ↗ primaryEUV photoresists 29.3 % ArF excimer laser photoresists 14.4 % KrF excimer laser photoresists 33.3 % g/i-Line photoresists 25.3 %Based on projected 2025 shipment volume; source Fuji Chimera Research Institute, cited on TOK website; page accessed 2026-09-24

Read from the sources Read from the source by an agent; quote matched mechanically against the fetched page; not yet reviewed by a person, 2026-09-24. Each value links the page it came from and quotes the sentence that carries it.