Photoresist formulation

• Other · WorldTOK global share, ArF photoresists14.4SourcedTokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field · 2025Open the source →Check this number with Ask %2025−11%How this is computedThe latest value in a series minus the value before it, divided by the earlier value, same series and unit.16.2 (2022) → 14.4 (2025).Method →Code →Check this number with Ask vs 2022

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  16.2 %2022DIGITIMES (citing Fuji Chimera via TOK website) ↗14.4 %2025Tokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field ↗

  20222025

  Period	Value	Source
  2025	14.4SourcedTokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field · 2025Open the source →Check this number with Ask %	Tokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field ↗ primaryEUV photoresists 29.3 % ArF excimer laser photoresists 14.4 % KrF excimer laser photoresists 33.3 % g/i-Line photoresists 25.3 %Based on projected 2025 shipment volume; source Fuji Chimera Research Institute, cited on TOK website; page accessed 2026-09-24
  2022	16.2SourcedDIGITIMES (citing Fuji Chimera via TOK website) · 2024-03-28Open the source →Check this number with Ask %	DIGITIMES (citing Fuji Chimera via TOK website) ↗ secondary reportthe company secured a global market share of 26.1% for photoresists overall in 2022. This included 16.2% for ArF photoresists, 36.6% for KrF photoresists, and 22.8% for g-line and i-line photoresists.

  Read from the sources Read from the source by an agent; quote matched mechanically against the fetched page; not yet reviewed by a person, 2026-09-24. Each value links the page it came from and quotes the sentence that carries it.

  Series pageDownload CSV

• Other · WorldTOK global share, KrF photoresists33.3SourcedTokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field · 2025Open the source →Check this number with Ask %2025−9%How this is computedThe latest value in a series minus the value before it, divided by the earlier value, same series and unit.36.6 (2022) → 33.3 (2025).Method →Code →Check this number with Ask vs 2022

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  36.6 %2022DIGITIMES (citing Fuji Chimera via TOK website) ↗33.3 %2025Tokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field ↗

  20222025

  Period	Value	Source
  2025	33.3SourcedTokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field · 2025Open the source →Check this number with Ask %	Tokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field ↗ primaryEUV photoresists 29.3 % ArF excimer laser photoresists 14.4 % KrF excimer laser photoresists 33.3 % g/i-Line photoresists 25.3 %Based on projected 2025 shipment volume; source Fuji Chimera Research Institute, cited on TOK website; page accessed 2026-09-24
  2022	36.6SourcedDIGITIMES (citing Fuji Chimera via TOK website) · 2024-03-28Open the source →Check this number with Ask %	DIGITIMES (citing Fuji Chimera via TOK website) ↗ secondary reportthe company secured a global market share of 26.1% for photoresists overall in 2022. This included 16.2% for ArF photoresists, 36.6% for KrF photoresists, and 22.8% for g-line and i-line photoresists.

  Read from the sources Read from the source by an agent; quote matched mechanically against the fetched page; not yet reviewed by a person, 2026-09-24. Each value links the page it came from and quotes the sentence that carries it.

  Series pageDownload CSV

• Other · WorldTOK global share, EUV photoresists29.3SourcedTokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field · 2025Open the source →Check this number with Ask %2025

  Period	Value	Source
  2025	29.3SourcedTokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field · 2025Open the source →Check this number with Ask %	Tokyo Ohka Kogyo (TOK) website, Semiconductor Manufacturing Field ↗ primaryEUV photoresists 29.3 % ArF excimer laser photoresists 14.4 % KrF excimer laser photoresists 33.3 % g/i-Line photoresists 25.3 %Based on projected 2025 shipment volume; source Fuji Chimera Research Institute, cited on TOK website; page accessed 2026-09-24

  Read from the sources Read from the source by an agent; quote matched mechanically against the fetched page; not yet reviewed by a person, 2026-09-24. Each value links the page it came from and quotes the sentence that carries it.

  Series pageDownload CSV

• Other · WorldTOK global share, all semiconductor photoresists26.1SourcedDIGITIMES (citing Fuji Chimera via TOK website) · 2022Open the source →Check this number with Ask %2022

  Period	Value	Source
  2022	26.1SourcedDIGITIMES (citing Fuji Chimera via TOK website) · 2024-03-28Open the source →Check this number with Ask %	DIGITIMES (citing Fuji Chimera via TOK website) ↗ secondary reportthe company secured a global market share of 26.1% for photoresists overall in 2022. This included 16.2% for ArF photoresists, 36.6% for KrF photoresists, and 22.8% for g-line and i-line photoresists.

  Read from the sources Read from the source by an agent; quote matched mechanically against the fetched page; not yet reviewed by a person, 2026-09-24. Each value links the page it came from and quotes the sentence that carries it.

  Series pageDownload CSV

Every series on every bottleneck — filter, compare and download.

The chemistry is qualified per process per fab and is overwhelmingly Japanese. Substituting a resist is a re-qualification programme, not a purchase.

Part of the process · Compute, which takes quarters to years to loosen once somebody decides to.

12How this is computedSum of four judged scores, each 0–3: concentration + substitution + lead time + inelasticity.Method →Code →Check this number with Ask / 12

Japanese chemistry, qualified per process per fab. Binding whenever export policy touches it, quiet otherwise.

• Dry and metal-oxide photoresists6/9Estimate, not a measurementDemonstrated on production-class tools and being qualified; qualification is per process and per factory, which is the slow part.By Substrata, open to challenge · 2026-09-15Supporting source →Check this number with Ask · Prototype at meaningful scale

  A second chemical route to the same step, from a different and less concentrated supply base.

All science →

1. Research30 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)+2 (Computed: Items first collected in the last 7 days whose publication or award date is within the last 30 days.) new
2. Lab16 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)+3 (Computed: Items first collected in the last 7 days whose publication or award date is within the last 30 days.) new
3. Pilot1 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
4. Early0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
5. Scale0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)

judged, with a citation claimed, no citationNumber: papers, preprints and grants the feeds collected — unreviewed

• Paper2026-10-12Materials0SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  Synthesis and Curing of Tetra-Component Phenolic Resin as a Candidate Resin for Further Investigation in Photoresist Formulations ↗

  The paper describes the synthesis and properties of a tetra-component phenolic resin as a candidate resin for further investigation in photoresist formulations, and its oligomer was synthesized via addition, condensation, and polycondensation reactions. Characterization was…

  Chinese Academy of SciencesQingdao Institute of Bioenergy and Bioprocess Technology

  Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI

• Paper2026-10-12ACS Applied Materials & Interfaces0SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  Dry Mask Transfer Lithography for High-Resolution Patterning of Nanomaterials and Molecular Interfaces on Arbitrary Substrates ↗

  This study introduces dry mask transfer lithography as a versatile microfabrication strategy that integrates the patterning resolution of photolithography with the substrate adaptability of soft lithography. In this method, a photoresist mask is first patterned on an elastomeric…

  Daegu Gyeongbuk Institute of Science and TechnologyPohang University of Science and TechnologyChung-Ang University

  Applied / lab · Says "fabricated".From OpenAlex · not yet reviewedDOI

• Paper2026-10-090SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  Electroluminescent photoresists: Extending Moore's Law to full-color OLEDs ↗

  The miniaturization of OLEDs is critical for next-generation ultrahigh-resolution displays and integrated photonics. However, traditional vacuum evaporation and inkjet printing methods are incompatible with the lithographic scaling processes that underpin silicon electronics…

  Applied / lab · Says "we demonstrate".From OpenAlex · not yet reviewedDOI

• Paper2026-10-09Low-Dimensional Materials and Devices0SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  Atomic layer deposition approaches for future extremely scaled microelectronic devices ↗

  The U.S. Department of Energy (DOE) National Laboratories advance microelectronics through coordinated programs and premier user facilities that connect fundamental science with technological innovation. This talk will overview key microelectronics research at Brookhaven National…

  Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI

• Paper2026-10-090SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  Precise fabrication of 3D microstructures via optimized diffuser grayscale lithography ↗

  Grayscale lithography enables the fabrication of three-dimensional microstructures in photoresist, which can subsequently be transferred into substrate materials by dry etching. Among the available techniques, diffuser-based grayscale lithography offers a cost-effective and…

  Applied / lab · Says "we demonstrate".From OpenAlex · not yet reviewedDOI

The full pipeline, by stage →

1. 2026-04-23
   TightensOutageJP KR

   Japanese photoresist makers warn Samsung and SK hynix that the Iran war has cut supply of the solvents the chemistry needs.

   thelec.net ↗secondary source

   The sentence that says so

   “A shortage of key solvents is disrupting production of photoresist and other photolithography materials in Japan.”

   Check this

All events →

• Siliconone turn: Months

  Worst judgement on this loop: 12 of 12How this is computedThe highest severity score among the bottlenecks recorded as gates on the loop.Method →Code →Check this number with Ask, judged 2026-09-15

A loop is one design, build and measure turn. Severity is a dated judgement on a 0–12 scale, not a measurement, and the judgements are not added together — the figure shown is the worst single one.

• Dry and metal-oxide photoresistsrelieved by

  source-backed readiness judgement

• Japanfound in

  directory join, not a sourced finding