Photoresist formulation
The light-sensitive chemistry that turns a projected pattern into a circuit. Overwhelmingly Japanese, and qualified factory by factory.
judged, with a citation claimed, no citationNumber: papers, preprints and grants the feeds collected — unreviewed
Searched for “photoresist”, “EUV resist”, “metal oxide resist”, “chemically amplified resist” in titles and abstracts.
All stagesFundamental researchApplied / labPilot / demonstrationEarly commercialAt scaleNewestMost cited
Applied / lab — readiness 3 to 4 of the nine-point scale. Evidence it takes: A paper reporting a device, process or material made and measured in a laboratory; an applied or SBIR Phase I grant; a patent.
Collected by the feeds
- Dry Mask Transfer Lithography for High-Resolution Patterning of Nanomaterials and Molecular Interfaces on Arbitrary Substrates
This study introduces dry mask transfer lithography as a versatile microfabrication strategy that integrates the patterning resolution of photolithography with the substrate adaptability of soft lithography. In this method, a photoresist mask is first patterned on an elastomeric…
Daegu Gyeongbuk Institute of Science and TechnologyPohang University of Science and TechnologyChung-Ang University
Applied / lab · Says "fabricated".From OpenAlex · not yet reviewedDOI
- Electroluminescent photoresists: Extending Moore's Law to full-color OLEDs
The miniaturization of OLEDs is critical for next-generation ultrahigh-resolution displays and integrated photonics. However, traditional vacuum evaporation and inkjet printing methods are incompatible with the lithographic scaling processes that underpin silicon electronics…
Applied / lab · Says "we demonstrate".From OpenAlex · not yet reviewedDOI
- Precise fabrication of 3D microstructures via optimized diffuser grayscale lithography
Grayscale lithography enables the fabrication of three-dimensional microstructures in photoresist, which can subsequently be transferred into substrate materials by dry etching. Among the available techniques, diffuser-based grayscale lithography offers a cost-effective and…
Applied / lab · Says "we demonstrate".From OpenAlex · not yet reviewedDOI
- Dual layer direct laser writing lithography for nanoscale patterning
We report a novel patterning technique termed dual-layer direct laser writing (DL-DLW), which utilizes laser direct-write lithography on a dual-layer photoresist stack to generate contoured features with linewidths below the original pattern specifications. The method exploits…
Fudan UniversityShanghai Zhangjiang LaboratoryZhangjiang Laboratory
Applied / lab · Says "fabricated".From OpenAlex · not yet reviewedDOI
- Wafer‐Scale Top‐Down Patterning of Metal Halide Perovskites
ABSTRACT Metal halide perovskites (MHPs) are promising semiconductor materials for next‐generation integrated photonics and electronics because they can be deposited from solution at low temperatures, enabling their monolithic integration with conventional semiconductor…
AMO (Germany)RWTH Aachen University
Applied / lab · Says "we demonstrate".From OpenAlex · not yet reviewedDOIPDF
- Photoresist-Free Lithography via Light-Induced Redox Patterning of Oxide Thin Films
Lithographic patterning of nanoscale devices typically depends on photoresists, wet processing and multistep pattern-transfer workflows that impose both environmental and scaling constraints. Focused laser irradiation of (Ni,Co)1+2xTi1-xO3 under a reducing atmosphere drives…
Applied / lab · Says "we demonstrate".From OpenAlex · not yet reviewedDOIPDFalso at arxiv.org
- Electroluminescent photoresists extending lithographic scaling to OLEDs
Abstract The miniaturization of organic light-emitting diodes is critical for next-generation ultrahigh-resolution displays and integrated photonics 1–8 . However, traditional vacuum evaporation and inkjet printing methods are incompatible with the lithographic scaling processes…
ETH ZurichInstitute for Chemical and BioengineeringNational Taiwan University of Science and TechnologyRMIT UniversityUniversity of Helsinki
Applied / lab · Says "we demonstrate".From OpenAlex · not yet reviewedDOI
- Wet Surface Treatment for Preventing Pattern Collapse of Dry-Film Photoresist in Panel-Level Redistribution Layer Interposer Fabrication
Dry-film photoresists (DFRs) are susceptible to pattern collapse arising from hydrophilic water–DFR interactions after the development process. Although wet surface treatment (rinsing) has been proposed to increase the hydrophobicity and prevent collapse, the associated surface…
Korea Electronics Technology InstituteSungkyunkwan UniversityHanyang University
Applied / lab · Says "fabricated".From OpenAlex · not yet reviewedDOI
- Direct Nanocrystal Patterning on Suspended MEMS Microheaters for Dual‐Temperature Gas Sensing
ABSTRACT Efficient integration of metal oxide nanocrystals with microelectromechanical systems (MEMS) microheaters is essential for developing compact gas‐sensing platforms, yet conventional deposition and patterning approaches often suffer from limited pattern fidelity and poor…
Shanghai UniversityChinese National Human Genome Center at ShanghaiState Key Laboratory of Transducer TechnologyShanghai Institute of Microsystem and Information TechnologyUniversity of Chinese Academy of Sciences
Applied / lab · Says "we demonstrate".From OpenAlex · not yet reviewedDOI
- YBCO Nanowire Fabricated based on laser exposure on photoresist
Abstract In this work, we present a fabrication process for YBa 2 Cu 3 O 7-δ (YBCO) superconducting nanowires based on nano-laser direct writing (NLDW) exposing the photoresist on YBCO film, which effectively suppresses thermal effect on the superconducting properties of devices…
Applied / lab · Says "we fabricated".From OpenAlex · not yet reviewedDOI
- Solvent-assisted transport of photo-acid generator in extreme ultraviolet photoresists and underlayers
Extreme ultraviolet (EUV) lithography is a cornerstone of next-generation computer chip patterning technologies, yet continued improvements in photoresist sensitivity and pattern fidelity are required to enable high-numerical-aperture EUV exposure tools. Numerous studies have…
Albany State UniversityUniversity at Albany, State University of New YorkBrewer Science (United States)
Applied / lab · Says "we demonstrate".From OpenAlex · not yet reviewedDOI
- Single-exposure holographic lithography of ultra-high aspect-ratio microstructures
Volumetric lithography offers a path to scalable fabrication of complex three-dimensional (3D) micro- and nanoscale architectures, yet existing approaches are limited by quasi-two-dimensional exposure physics or slow serial writing. We present a single-exposure volumetric…
Applied / lab · Says "we fabricate".From arXiv · not yet reviewedPDF
- High-Repetition-Rate Projection Multiphoton Lithography for Large-Area Sub-Micron 3D Printing
High-resolution lithographic techniques are often limited by low volumetric throughput, since there is no universal and scalable manufacturing process that can produce 3D metasurfaces. In this work, we demonstrate a high-speed holographic 3D printing platform based on…
Institute of Electronic Structure and Laser, Foundation for Research and Technology-Hellas
Applied / lab · Says "we demonstrate".From arXiv · not yet reviewedPDF
- Patterning perovskite colour converters for AR/VR microdisplays
Colour conversion offers the clearest path to achieve RGB colours in high resolution microdisplays for AR/VR. With resolutions beyond 5000 ppi (i.e. RGB pitch of 5 um), the thickness of the conversion layers is critical for efficiency and manufacturing. Perovskites outperform…
Applied / lab · Says "we demonstrate".From arXiv · not yet reviewedPDF
- Etching-free dual-lift-off for direct patterning of epitaxial oxide thin films
Although monocrystalline oxide films offer broad functional capabilities, their practical use is hampered by challenges in patterning. Traditional patterning relies on etching, which can be costly and prone to issues like film or substrate damage, under-etching, over-etching, and…
Applied / lab · Says "fabricated".From arXiv · not yet reviewedDOIPDF
- Evolution in Lithography Techniques: Microlithography to Nanolithography
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily. Different types of temperature sensors, biosensors, photosensors…
Chaudhary Ranbir Singh UniversityKanya Maha Vidyalaya
Applied / lab · Says "fabricated".From OpenAlex · not yet reviewedDOIPDF