Photoresist formulation
The light-sensitive chemistry that turns a projected pattern into a circuit. Overwhelmingly Japanese, and qualified factory by factory.
judged, with a citation claimed, no citationNumber: papers, preprints and grants the feeds collected — unreviewed
Searched for “photoresist”, “EUV resist”, “metal oxide resist”, “chemically amplified resist” in titles and abstracts.
All stagesFundamental researchApplied / labPilot / demonstrationEarly commercialAt scaleNewestMost cited
Fundamental research — readiness 1 to 2 of the nine-point scale. Evidence it takes: A paper or preprint on the underlying physics or chemistry; a basic-research grant.
Collected by the feeds
- Synthesis and Curing of Tetra-Component Phenolic Resin as a Candidate Resin for Further Investigation in Photoresist Formulations
The paper describes the synthesis and properties of a tetra-component phenolic resin as a candidate resin for further investigation in photoresist formulations, and its oligomer was synthesized via addition, condensation, and polycondensation reactions. Characterization was…
Chinese Academy of SciencesQingdao Institute of Bioenergy and Bioprocess Technology
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Atomic layer deposition approaches for future extremely scaled microelectronic devices
The U.S. Department of Energy (DOE) National Laboratories advance microelectronics through coordinated programs and premier user facilities that connect fundamental science with technological innovation. This talk will overview key microelectronics research at Brookhaven National…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Semi-interpenetrating networks enable the controllable patterning of conjugated polymers for integration in microstructure sensors
The realization of micro-nano patterning and flexible integration of conjugated polymers (CPs) requires not only high-efficiency charge transport but also the dual capabilities of sub-micrometer processing precision and mechanical flexibility. Herein, a dual-component conductive…
Dalian University of TechnologyState Key Laboratory of Fine ChemicalsShenzhen University
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Blazed Diffraction Grating Made by Greyscale Lithography Using a Laser Writer
This study demonstrates a single-step fabrication of blazed gratings on silicon substrates using direct laser greyscale lithography and aluminum coating. Three key parameters were studied for process optimization, i.e., the exposure dose of the photoresist, the focusing method…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Immersion-Controlled Nanoparticle Electrodeposition on a Patterned Pyrolyzed Photoresist Film Electrode for Single-Entity Electrochemistry Studies Using Scanning Electrochemical Cell Microscopy
Abstract We report immersion-controlled electrodeposition as a simple means to fabricate a substrate with defined zones of differently sized nanoparticles and demonstrate its application in scanning electrochemical cell microscopy (SECCM) studies. Defined zones were formed via…
Kansas State UniversityTexas A&M University
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDF
- A lab-scale EUV scatterometry setup for nanograting and latent image metrology
The authors present their recent work regarding a lab-scale EUV reflectometry and scatterometry setup for metrology on thin-films, nanoscale gratings and latent images in a positive tone, chemically amplified EUV photoresist. Optical metrology methods like scatterometry are…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Development-kinetics-guided profile compensation for precision fabrication of three-level stepped riblets by thick-photoresist laser direct writing
Northwestern Polytechnical University
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Morphology-Based Label-Free Cell Separation System Utilizing a Cell-friendly Photoresist and Deep Learning
Abstract Cell separation technology is essential for cell-based analysis and therapy. However, high-fidelity isolation of specific cell subsets from limited specimens remains a significant challenge, as conventional methods such as fluorescence-activated cell sorting (FACS) and…
Seoul National UniversityKangwon National University
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDF
- Selective membrane separation of photoresist-derived organics and tetramethylammonium hydroxide in real wastewater from semiconductor industry
State Key Laboratory of Pollution Control and Resource Reuse
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Tunable Positive/Negative Tone Switching in Sn-Based Extreme Ultraviolet Lithography Dry Resists: Mechanism and Sub-7 nm Patterning
As integrated circuit technology scales toward the Angstrom era, the limitations of traditional spin-coated wet photoresists-specifically regarding stochastic defects and pattern collapse-have become critical bottlenecks for high-numerical-aperture extreme ultraviolet (high-NA…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Nonchemically Amplified Resists Enabled by Imide-Modified Poly(styrenesulfonate) Homopolymer with Enhanced Lithography Performance
Abstract Photoresists are fundamental to the modern electronics industry. Conventional chemically amplified resists suffer a tradeoff between acid diffusion and photosensitivity, while homopolymer-based nonchemically amplified resists (n-CARs) serve as promising alternatives in…
ShanghaiTech UniversityShanghai Zhangjiang LaboratoryZhangjiang LaboratoryShanghai UniversityShanghai University of Engineering Science
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Femtosecond HHG-based actinic EUV exposure platform for quantitative photoresist evaluation
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Toward Human-Centered Lithography Environments: Seven Reasons to Replace Yellow Lighting with Candlelight-Style LED Illumination
Semiconductor manufacturing relies on specialized yellow lighting in lithography fabs to prevent photoresist degradation, but such artificial lighting may raise concerns regarding human health and ESG goals. This study evaluates whether natural light-style candlelight can replace…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Fast PEB model of lithography photoresist based on Res-Attention U-Net
Post-exposure bake (PEB) is a key step in the lithography process of chemically amplified resist (CAR). The result of PEB directly determines the final resist profile. The PEB process of CAR involves a series of complex physicochemical reactions, thus it is very time-consuming to…
Beijing Institute of Technology
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Effect of Acid-Labile Protecting-Group Structure on the Micrometer-Scale Patterning Performance of Core-First RAFT-Synthesized Three-Arm Photoresists
Controlling dimensional fidelity and line-edge roughness is important in chemically amplified negative-tone imaging. In this study, two three-arm random terpolymers containing different acid-labile protecting groups were synthesized via core-first reversible…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography
Pentafluorophenyl triflate has been explored as a highly absorbing neutral photoacid generator (PAG) candidate for next generation chemically amplified resists used in extreme ultraviolet (EUV) lithography. Although increased fluorination enhances EUV absorption, this study…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDFalso at arxiv.orgalso at doi.org
- Revealing Structure-Driven Performance of Molecular-Atomic Layer Deposited Resists for Extreme Ultraviolet Lithography through In Situ Analysis
Abstract Advancing resist chemistry remains a central challenge for extreme ultraviolet (EUV) lithography to sustain device scaling beyond the sub-1 nm technology node. Molecular-atomic layer deposited (MALD) inorganic–organic hybrid resists offer a promising route owing to their…
The University of Texas at DallasUniversity of North Texas at DallasBrookhaven National LaboratoryHanyang UniversityLawrence Berkeley National Laboratory+1 more
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Transfer‐Stacked and Pre‐Tunable Bilayer Photoresist for High‐Yield Dry Lift‐off and Multiscale Patterning
Photolithography, a cornerstone of semiconductor manufacturing, faces persistent challenges in lift-off processes, particularly regarding solvent usage, sidewall adhesion, and limited pattern fidelity. While dry lift-off and bilayer resist schemes provide promising alternatives…
Hunan UniversitySingapore University of Technology and Design
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDF
- Scaling a CUDA-Q GQE + QSCI pipeline to 40 qubits for EUV photoresist chemistry
We scale a CUDA-Q-native pipeline coupling a generative quantum eigensolver (GQE) to quantum-selected configuration interaction (QSCI) across active spaces of 14 to 44 qubits, applied to the extreme-ultraviolet (EUV) photoresist chemistry of monoalkyltin oxo-hydroxides. A GPT-2…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedPDF
- Direct Photochemical Patterning of Lithium Niobate Thin Films for Scalable Nonlinear Optical Metasurfaces
Lithium niobate is one of the most sought-after materials for nanophotonic devices, including frequency converters, modulators, and quantum light sources. Integration of lithium niobate into optical devices, however, is hampered by significant top-down fabrication challenges due…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedPDF
- Impact of Oxygen Plasma Surface Treatment on Photoresist Adhesion in BaTiO3-Based Photonic Device Fabrication
Oxygen-plasma pre-cleans are routine before fabrication, but on BaTiO3 thin films we observed catastrophic photoresist lift-off during mild rinsing and sonication. To explain the failure, we combined optical microscopy, EDS, and XPS. EDS showed no meaningful bulk stoichiometry…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedPDF
- Equipment: MRI: Track 2 Acquisition of an Extreme Ultra Violet (EUV) Resist Flood Exposure Tool
Modern life depends on powerful computer chips that run everything from smartphones to medical devices. Making these chips requires creating incredibly small features, far tinier than the width of a human hair. To achieve this, the electronics industry now uses a special kind of…
Fundamental research · Research grant.From NSF awards · not yet reviewed
- Collaborative Research: DMREF: AI-Informed, Closed-Loop Design of Negative Resists for High-Volume EUV Lithography
Non-technical Description: The mass production of integrated circuits (commonly known as ‘microchips’ or simply ‘chips’) is a key driver for modern computational advances. Chip manufacturing requires a process called photolithography to template the intricate patterns of…
University of Wisconsin-Madison
Fundamental research · Research grant.From NSF awards · not yet reviewedalso at nsf.gov
- FMSG: Cyber: Molecular Layer Deposition for EUV Photoresists
This project aims to help advance the field of semiconductor manufacturing by addressing a critical challenge in extreme ultraviolet (EUV) photolithography, a technology essential for creating the next generation of integrated circuits with features smaller than 10 nanometers…
Fundamental research · Research grant.From NSF awards · not yet reviewed
- Fundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists
Metal oxide resists (MORs) have shown great promise for high resolution patterning in extreme ultraviolet (EUV) lithography, with potential for integration into high volume manufacturing. However, MORs have recently been shown to exhibit sensitivity to process conditions and…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedDOIPDF
- Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Trends in photoresist materials for extreme ultraviolet lithography: A review
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Recent developments in photoresists for extreme-ultraviolet lithography
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Exceptional Light Sensitivity by Thiol–Ene Click Lithography
Lithographic patterning, which utilizes the solubility switch of photoresists to convert optical signals into nanostructures on the substrate, is the primary top-down approach for nanoscale fabrication. However, the low light/electron-energy conversion efficiency severely limits…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Mechanical nanolattices printed using nanocluster-based photoresists
Natural materials exhibit emergent mechanical properties as a result of their nanoarchitected, nanocomposite structures with optimized hierarchy, anisotropy, and nanoporosity. Fabrication of such complex systems is currently challenging because high-quality three-dimensional (3D)…
Stanford UniversityNorthwestern University
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI