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Photoresist formulation

The light-sensitive chemistry that turns a projected pattern into a circuit. Overwhelmingly Japanese, and qualified factory by factory.

The bottleneck itself →

  1. Research30 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)+2 (Computed: Items first collected in the last 7 days whose publication or award date is within the last 30 days.) new
  2. Lab16 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)+3 (Computed: Items first collected in the last 7 days whose publication or award date is within the last 30 days.) new
  3. Pilot1 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
  4. Early0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
  5. Scale0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)

judged, with a citation claimed, no citationNumber: papers, preprints and grants the feeds collected — unreviewed

Searched for “photoresist”, “EUV resist”, “metal oxide resist”, “chemically amplified resist” in titles and abstracts.

47 collected items, newest first ↓Judged by hand ↓Who is active ↓

All stagesFundamental researchApplied / labPilot / demonstrationEarly commercialAt scaleNewestMost cited

Judged by hand

Readiness and substitute status, with reasoning

  • TechnologyPilot / demonstrationreadiness Estimate, not a measurementDemonstrated on production-class tools and being qualified; qualification is per process and per factory, which is the slow part.By Substrata, open to challenge · 2026-09-15Supporting source →Judgement, cited · 2026-09-15

    Dry and metal-oxide photoresists

    Demonstrated on production-class tools and being qualified; qualification is per process and per factory, which is the slow part.

    Source ↗

Collected by the feeds

Newest first