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Equipment & consumables · Netherlands

ASML

ASML NAASML US Work there, own it, buy from it ↓

EUV and DUV lithography systems — holds How this is computedCount of bottlenecks on which this organisation is recorded as a producer, a holder of the capacity, or a supplier of a critical part.Method →Code → of the How this is computedCount of rows in the bottleneck corpus: every material plus every non-material chokepoint.Method →Code → bottlenecks tracked here, and is the only maker recorded for EUV lithography scanners.

Bottlenecks held1 (Computed: Count of bottlenecks on which this organisation is recorded as a producer, a holder of the capacity, or a supplier of a critical part.) of 331 with no other maker recordedHardest binding12 (Estimate by Substrata, 2026-09-15: concentration 3 + substitution 3 + lead time 3 + inelasticity 3 = 12 of 12)/12EUV lithography scanners · judged 2026-09-15Directory gradeChokepointa judgement, not a sourced factEvents1 (Computed: Accepted events that name this organisation, plus (counted separately) accepted events on a bottleneck it holds that do not name it.)name it

Why graded so · One company on earth builds EUV, its order backlog is measured in tens of billions of euros, and no second source is in progress.

Role cited from asml.com ↗. The grade is this project’s judgement. Report an error

Searching is free and needs no AI. Summaries use your own AI model.

01Chokepoints it holds

1 of 1 sourced
  • EUV lithography scanners

    Makes it · Binding now

    No other maker recorded.

    Critical parts from Carl Zeiss SMT DE, Trumpf DE

    Sourced: asml.com ↗

    Estimate, not a measurementconcentration 3 + substitution 3 + lead time 3 + inelasticity 3 = 12 of 12. One maker, a backlog in the tens of billions of euros, no second source in progress. The definition of a chokepoint.By Substrata · 2026-09-15Supporting source →/123+3+3+3

Score = concentration + substitution + lead time + inelasticity, each 0–3, an analyst judgement dated 2026-09-15; open a score for its rationale and assessment. Makers are those the corpus records, not the whole market. No market-share figure is sourced, so none is shown.

02What has happened

1 name it
  1. 2026-04-15
    LoosensCapacityNL

    ASML plans to ship more than 60 EUV scanners in 2026, high-NA and low-NA together, on memory demand.

    EUV lithography scanners

    WhoASML

    techpowerup.com ↗official source

    The sentence that says so

    “In the latest Q1 2026 quarterly figures, ASML announced plans to ship over 60 EUV units this year, including both High-NA and Low-NA EUV lithography scanners.”

All events →

03Unread leads

6 found by the sweep, unread

Pages the sweep found on these chokepoints. Nobody here has read them yet; they are not events and not evidence.

04What could loosen its grip

about its chokepoints, not the company
  • Nanoimprint lithography

    Printing chip patterns by pressing a patterned mask into resist like a stamp, instead of projecting an image through lenses and mirrors.

    Science · for EUV lithography scanners

    readiness
    Estimate, not a measurementPrototype at meaningful scale. Canon commercialised the FPA-1200NZ2C in October 2023 and shipped one to the Texas Institute for Electronics in 2024, at 14 nm minimum linewidth — equivalent to a 5 nm node. That is a real machine doing real patterning, but not volume logic production: throughput, defectivity and the supply of 1:1 imprint masks are the open questions, and a stamp touching the wafer fails differently from light.By Substrata · 2026-09-18Supporting source →/9

Readiness is the 1–9 technology-readiness scale, a dated judgement; open a figure for the reasoning and its source.

05SEC filings

2 most recent, from SEC EDGAR

The company’s own filings, from SEC EDGAR, fetched hourly. Substrata has not judged their effect on any bottleneck.

06Others at the same step of the chain

directory rows · grades are judgements

07Ways to take part

how to reach it, not whether to

Not investment advice. This says how the public can reach a company — a job, its shares, its products — not whether anyone should. It takes no account of anyone’s circumstances, and a company holding a chokepoint is not a reason to own it. What this is not

Work there
It publishes its roles on its own careers page.Official careers page ↗
Own part of it
Its shares trade publicly as ASML NA and ASML US, bought and sold through a broker that reaches that exchange.ASML NA listing record ↗ASML US listing record ↗Its SEC filings
Buy from it
What it does in the chain: EUV and DUV lithography systems. At this depth of the chain most sales are to other businesses, under contract. Its own page describes what it offers.Its own page ↗

08Hiring

official careers page

Its roles are published on its own site, which Substrata links rather than reads. Official careers page ↗

09What this holds up

1 loop
  • Siliconone turn: Months

    makes EUV lithography scanners, which gates it.

    Worst judgement on this loop: How this is computedThe highest severity score among the bottlenecks recorded as gates on the loop.Method →Code →, judged 2026-09-15 · this join is sourced

A loop is one design, build and measure turn. Severity is a dated judgement on a 0–12 scale, not a measurement, and the judgements are not added together — the figure shown is the worst single one.

10Sources

2 cited
  1. asml.com ↗ — its role in the chain: EUV and DUV lithography systems; EUV lithography scanners: makes it
  2. techpowerup.com ↗ — event, 2026-04-15: ASML plans to ship more than 60 EUV scanners in 2026, high-NA and low-NA together, on memory demand.

Discussion

Comments use threadkit (permission is participation). Sign in with OrangeCat to write. Fact-check is the same assistant as Ask, grounded in the corpus.

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