EUV projection optics

• Output · company: Carl Zeiss SMTZEISS SMT segment revenue5.055SourcedZEISS fiscal year 2024/25 results · 2025Open the source →Check this number with Ask EUR bn2025+23%How this is computedThe latest value in a series minus the value before it, divided by the earlier value, same series and unit.4.122 (2024) → 5.055 (2025).Method →Code →Check this number with Ask vs 2024 · loosens

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  2.757 EUR bn2022ZEISS fiscal year 2022/23 results ↗3.555 EUR bn2023ZEISS fiscal year 2022/23 results ↗4.122 EUR bn2024ZEISS fiscal year 2023/24 results ↗5.055 EUR bn2025ZEISS fiscal year 2024/25 results ↗

  20222025

  Period	Value	Source
  2025	5.055SourcedZEISS fiscal year 2024/25 results · 2025-12-18Open the source →Check this number with Ask EUR bn	ZEISS fiscal year 2024/25 results ↗ primarySemiconductor Manufacturing Technology 5.055 4.122 +23% (23%)ZEISS fiscal year runs Oct 1 - Sep 30; date = calendar year in which FY ends. SMT segment covers lithography optics (EUV+DUV) plus photomask and process-control businesses, not only EUV optics.
  2024	4.122SourcedZEISS fiscal year 2023/24 results · 2024-12-17Open the source →Check this number with Ask EUR bn	ZEISS fiscal year 2023/24 results ↗ primarySemiconductor Manufacturing Technology 4,122 3,555 16% (16%)ZEISS fiscal year runs Oct 1 - Sep 30; date = calendar year in which FY ends. SMT segment covers lithography optics (EUV+DUV) plus photomask and process-control businesses, not only EUV optics. Stated in EUR million (4,122).
  2023	3.555SourcedZEISS fiscal year 2022/23 results · 2023-12-19Open the source →Check this number with Ask EUR bn	ZEISS fiscal year 2022/23 results ↗ primarySemiconductor Manufacturing Technology 3,555 2,757 +29% (+29%)ZEISS fiscal year runs Oct 1 - Sep 30; date = calendar year in which FY ends. SMT segment covers lithography optics (EUV+DUV) plus photomask and process-control businesses, not only EUV optics. Stated in EUR million.
  2022	2.757SourcedZEISS fiscal year 2022/23 results · 2023-12-19Open the source →Check this number with Ask EUR bn	ZEISS fiscal year 2022/23 results ↗ primarySemiconductor Manufacturing Technology 3,555 2,757 +29% (+29%)ZEISS fiscal year runs Oct 1 - Sep 30; date = calendar year in which FY ends. SMT segment covers lithography optics (EUV+DUV) plus photomask and process-control businesses, not only EUV optics. Prior-year column, EUR million.

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• Workforce · company: Carl Zeiss SMTZEISS SMT headcount9,349SourcedZEISS SMT About us (in figures) · 2025Open the source →Check this number with Ask people (FTE)2025

  Period	Value	Source
  2025	9,349SourcedZEISS SMT About us (in figures) · 2025Open the source →Check this number with Ask people (FTE)	ZEISS SMT About us (in figures) ↗ primary9,349 Colleagues (based on full-time equivalent) work on pioneering innovations for the semiconductor industryPage undated; shown alongside FY2024/25 revenue, so likely FY2024/25 (to Sep 2025) - accessed 2026-09-24

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• Other · company: Carl Zeiss SMTZEISS EUV development partner network1,200SourcedZEISS SMT About us (in figures) · 2025Open the source →Check this number with Ask partners2025

  Period	Value	Source
  2025	1,200SourcedZEISS SMT About us (in figures) · 2025Open the source →Check this number with Ask partners	ZEISS SMT About us (in figures) ↗ primary1,200 International partners in the development networkPage undated; accessed 2026-09-24

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• Other · company: Carl Zeiss SMTEUV illumination system part count15,000SourcedZEISS SMT press release: 30 years of EUV lithography optics · 1 Apr 2025Open the source →Check this number with Ask parts1 Apr 2025

  Period	Value	Source
  1 Apr 2025	15,000SourcedZEISS SMT press release: 30 years of EUV lithography optics · 2025-04-01Open the source →Check this number with Ask parts	ZEISS SMT press release: 30 years of EUV lithography optics ↗ primaryThe ZEISS EUV illumination system consists of 15,000 individual parts and weighs 1.5 tons.

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Every series on every bottleneck — filter, compare and download.

The mirror systems inside the scanner are polished to a tolerance one supplier has ever achieved. It is a chokepoint inside a chokepoint, and the constraint is know-how, not capacity.

Part of the process · Compute, which takes quarters to years to loosen once somebody decides to.

12How this is computedSum of four judged scores, each 0–3: concentration + substitution + lead time + inelasticity.Method →Code →Check this number with Ask / 12

One optics maker inside the one scanner maker. The constraint is know-how, and it does not copy.

• 2026-09-14European UnionSlows building

  2026 update of the EU control list of dual-use items

  Adds chipmaking equipment to the EU control list, including deposition tools for molybdenum and ruthenium and EUV mask inspection.

  European Commission, DG Trade and Economic Security ↗

All policy →

• Nanoimprint lithography6/9Estimate, not a measurementCanon commercialised the FPA-1200NZ2C in October 2023 and shipped one to the Texas Institute for Electronics in 2024, at 14 nm minimum linewidth — equivalent to a 5 nm node. That is a real machine doing real patterning, but not volume logic production: throughput, defectivity and the supply of 1:1 imprint masks are the open questions, and a stamp touching the wafer fails differently from light.By Substrata, open to challenge · 2026-09-18Supporting source →Check this number with Ask · Prototype at meaningful scale

  Canon states the transfer "does not go through an optical mechanism", so the mirror stack that only one company can polish is not in the path.

All science →

1. Research33 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)+1 (Computed: Items first collected in the last 7 days whose publication or award date is within the last 30 days.) new
2. Lab8 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)+1 (Computed: Items first collected in the last 7 days whose publication or award date is within the last 30 days.) new
3. Pilot0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
4. Early0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
5. Scale0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)

judged, with a citation claimed, no citationNumber: papers, preprints and grants the feeds collected — unreviewed

• Paper2026-10-090SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  Study of interfacial structure and optical performance of hard x-ray multilayer mirrors ↗

  We investigate three different multilayer (ML) systems - Mo/Si, W/B₄C, and Ru/B₄C- with an emphasis on their structural characteristics and some representative optical performance for application in the hard x-ray region. High-quality Mo/Si and W/B₄C MLs with well-defined…

  Applied / lab · Says "fabricated".From OpenAlex · not yet reviewedDOI

• Paper2026-10-090SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  Development of high-precision nickel electroforming process for EUV and x-ray optics ↗

  Electroforming is a replication technique that produces metal components with inverse geometries of a mandrel by electrodepositing thick metal layers onto its surface and subsequently separating them. Owing to its superior replication accuracy, this technique is widely used for…

  Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI

• Paper2026-09-240SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  Mo2N as a novel barrier layer to mitigate interface imperfection in (Mo/Si)-based soft x-ray multilayer mirror ↗

  Mo/Si serves as a popular pair of building block for development of soft X-ray mirror offering theoretical peak reflectivity ~70%. However, interface imperfection at Mo/Si interface is an important concern which often limits the experimental peak reflectivity down to ~60 % to…

  Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI

• Paper2026-09-240SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  Benefits of alternative reticles for high-NA EUV logic metal printing ↗

  The introduction of ASML’s EXE:5000 scanner has allowed to keep Moore’s law on track. It uses a Numerical Aperture (NA) of 0.55, which, compared to the 0.33NA of the NXE scanners, allows for a significant increase in resolution and enables the printing of unprecedently small…

  Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI

• Paper2026-09-240SourcedOpenAlex, as fetchedOpen the source →Check this number with Ask citations

  A lab-scale EUV high-intensity exposure setup for small-spot exposures and angular-resolved photoelectron spectroscopy ↗

  This work investigates extreme ultraviolet (EUV)-induced photoemission in materials relevant for EUV lithography, combining synchrotron-based X-ray photoelectron spectroscopy (XPS and ARPES) measurements with Monte Carlo photoemission modeling. Gold (Au) is used as a reference…

  Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI

The full pipeline, by stage →

• Siliconone turn: Months

  Worst judgement on this loop: 12 of 12How this is computedThe highest severity score among the bottlenecks recorded as gates on the loop.Method →Code →Check this number with Ask, judged 2026-09-15

A loop is one design, build and measure turn. Severity is a dated judgement on a 0–12 scale, not a measurement, and the judgements are not added together — the figure shown is the worst single one.

• Nanoimprint lithographyrelieved by

  source-backed readiness judgement

• 2026 update of the EU control list of dual-use itemsgoverned by

  primary source

• Germanyfound in

  directory join, not a sourced finding