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EUV projection optics

The mirrors inside those machines, polished flatter than anything else made. One supplier has ever achieved it.

The bottleneck itself →

Searched for “EUV mirror”, “EUV optics”, “multilayer mirror”, “Mo/Si multilayer” in titles and abstracts.

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All stagesFundamental researchApplied / labPilot / demonstrationEarly commercialAt scaleNewestMost cited

Pilot / demonstration — readiness 5 to 7 of the nine-point scale. Evidence it takes: A pilot line, field trial or demonstration announced by the organisation running it; a demonstration or SBIR Phase II grant.

Judged by hand

Readiness and substitute status, with reasoning
  • TechnologyPilot / demonstrationreadiness Estimate, not a measurementCanon commercialised the FPA-1200NZ2C in October 2023 and shipped one to the Texas Institute for Electronics in 2024, at 14 nm minimum linewidth — equivalent to a 5 nm node. That is a real machine doing real patterning, but not volume logic production: throughput, defectivity and the supply of 1:1 imprint masks are the open questions, and a stamp touching the wafer fails differently from light.By Substrata, open to challenge · 2026-09-18Supporting source →Judgement, cited · 2026-09-18

    Nanoimprint lithography

    Canon commercialised the FPA-1200NZ2C in October 2023 and shipped one to the Texas Institute for Electronics in 2024, at 14 nm minimum linewidth — equivalent to a 5 nm node. That is a real machine doing real patterning, but not volume logic production: throughput, defectivity and the supply of 1:1 imprint masks are the open questions, and a stamp touching the wafer fails differently from light.

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