EUV projection optics
The mirrors inside those machines, polished flatter than anything else made. One supplier has ever achieved it.
judged, with a citation claimed, no citationNumber: papers, preprints and grants the feeds collected — unreviewed
Searched for “EUV mirror”, “EUV optics”, “multilayer mirror”, “Mo/Si multilayer” in titles and abstracts.
All stagesFundamental researchApplied / labPilot / demonstrationEarly commercialAt scaleNewestMost cited
Fundamental research — readiness 1 to 2 of the nine-point scale. Evidence it takes: A paper or preprint on the underlying physics or chemistry; a basic-research grant.
Collected by the feeds
- Development of high-precision nickel electroforming process for EUV and x-ray optics
Electroforming is a replication technique that produces metal components with inverse geometries of a mandrel by electrodepositing thick metal layers onto its surface and subsequently separating them. Owing to its superior replication accuracy, this technique is widely used for…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Mo2N as a novel barrier layer to mitigate interface imperfection in (Mo/Si)-based soft x-ray multilayer mirror
Mo/Si serves as a popular pair of building block for development of soft X-ray mirror offering theoretical peak reflectivity ~70%. However, interface imperfection at Mo/Si interface is an important concern which often limits the experimental peak reflectivity down to ~60 % to…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Benefits of alternative reticles for high-NA EUV logic metal printing
The introduction of ASML’s EXE:5000 scanner has allowed to keep Moore’s law on track. It uses a Numerical Aperture (NA) of 0.55, which, compared to the 0.33NA of the NXE scanners, allows for a significant increase in resolution and enables the printing of unprecedently small…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- A lab-scale EUV high-intensity exposure setup for small-spot exposures and angular-resolved photoelectron spectroscopy
This work investigates extreme ultraviolet (EUV)-induced photoemission in materials relevant for EUV lithography, combining synchrotron-based X-ray photoelectron spectroscopy (XPS and ARPES) measurements with Monte Carlo photoemission modeling. Gold (Au) is used as a reference…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Interference-governed electromagnetic-thermal coupling and heat transport in multilayer nanofilms under pulsed extreme-ultraviolet irradiation
Mo/Si multilayer mirrors are central to extreme ultraviolet (EUV) lithography, where nanoscale optical interference and heat accumulation together constrain reflectivity and operational stability. Conventional surface-flux-based models become inadequate for EUV multilayers…
Nanjing Normal UniversityHong Kong University of Science and TechnologySoutheast University
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Agent-authored deposition recipes for X-ray multilayer mirrors: schema-bound LLM control of a magnetron sputtering system with reflectivity-verified outcomes
Periodic multilayer mirrors for X-rays require a layer period controlled to about 0.1 nm, set by deposition rates held in the laboratory's own notebook. A supervising model session gave a large language model agent a target multilayer specification and calibration constants…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDFalso at arxiv.org
- Microstructural evolution and in-situ Sn cleaning of Ru-capped Mo/Si multilayers under EUV-relevant H/D isotope plasma irradiation
Sichuan UniversityTongji University
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Metasurfaces for deep and extreme ultraviolet optics: a review
Abstract The high photon energy of ultraviolet (UV) radiation has enabled extensive applications in medical research, sterilization, environmental protection, and semiconductor manufacturing. This is particularly evident in semiconductor lithography, where deep UV (DUV) and…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDF
- Evaluation technologies for the fabrication of ultraprecision DUV and EUV optics
Ultra-precision optics for deep-ultraviolet (DUV) and extreme-ultraviolet (EUV) semiconductor inspection or lithographic equipment demand sub-nanometer-level fabrication and metrology capabilities. We present the metrology infrastructure developed at KRISS to support the in-house…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Theory and Technological Route Exploration of Nanofabrication Based on Kang Non-Equilibrium Entropy ——From a Non-Equilibrium Thermodynamic Framework to the Conceptual Design of a Negative Entropy Localized Electron Beam Nano-Sculpting System
Current 7nm and below advanced process chip manufacturing relies heavily on Extreme Ultraviolet (EUV) lithography equipment, which operates on the principle of equilibrium-state random photon global projection. According to publicly available technical specifications: the CO₂…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIalso at doi.org
- Tailoring the Composition of B 4 C Layer by H 2 /Ar Sputtering for High‐Reflectance La/B 4 C‐Based Multilayers
High‐reflectance multilayer mirrors represent key components for next‐generation lithography applications. In this work, La/LaN/B 4 C multilayers were deposited with different flow ratios of H 2 /Ar mixed gas using magnetron sputtering. The interface properties and composition of…
Shanghai Institute of Optics and Fine MechanicsUniversity of Chinese Academy of Sciences
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- High-damage-threshold TiO 2 /SiO 2 multilayer mirror coating for high-repetition-rate femtosecond laser applications
We report on the fabrication and femtosecond-laser-damage characterization of ion-beam-sputtered TiO 2 /SiO 2 multilayer mirror coatings designed for operation at 1030 nm under high-repetition-rate irradiation. The 41-layer dielectric stack deposited on fused silica substrates…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Tungsten-rhenium alloy as a high-density absorber in ultra-short-period multilayer for hard X-ray mirrors
Ultra-short-period multilayer mirrors (period d below 5 nm) are key components for hard X-ray optics in the 20 keV–40 keV range, but their performance rapidly degrades when the period approaches a few nanometers due to density loss and/or interfacial defects (roughness or…
Centre National de la Recherche ScientifiqueUniversité Paris-SaclayLaboratoire Charles FabryCentraleSupélecEuropean Synchrotron Radiation Facility+3 more
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDF
- First Observation of the γ -ray Beam Production by the Backward Compton Scattering of Reflected Synchrotron Radiation in the Extreme Ultraviolet Range
Abstract Compton scattering of photons off high-energy electrons is a fundamental quantum mechanical process widely utilized to produce a $\gamma$-ray beam for scientific research. Instead of injecting laser light into a storage ring as is the conventional way, we have developed…
Institute of Modern PhysicsThe University of OsakaTohoku UniversityUniversity of Hyogo
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDFalso at arxiv.org
- Prospects for soft gamma-ray focusing optics via multilayer-coated grazing-incidence mirrors
Many critical science questions in gamma-ray astrophysics are limited by the sensitivity and angular resolution of current telescope technologies, namely the lack of focusing optics in the 0.1–1.0 MeV photon regime. We review promising technical advances that suggest soft…
University of IowaMarshall Space Flight CenterUniversities Space Research AssociationNational Space Science and Technology CenterGoddard Space Flight Center+1 more
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDF
- Effects of sputtering pressures on microstructure and intrinsic stress of EUV Sc/Si multilayers
Controlling intrinsic stress is crucial for the performance and stability of Sc/Si multilayer mirrors at 46.5 nm. This study investigates the effect of sputtering pressure (1.1 to 3.0 mTorr) on the microstructure and intrinsic stress of magnetron-sputtered Sc/Si multilayers with…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Pseudo-spectral frequency-domain method with background field decomposition and Green's function preconditioner for electromagnetic scattering problem in EUV lithography
We provide an accelerated computational framework to solve electromagnetic scattering problems in planarly layered media arising from extreme ultraviolet (EUV) lithography. To achieve this, we reformulate the EUV scattering problem into a scattering problem on a homogeneous…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDFalso at arxiv.org
- Time-of-flight secondary ion mass spectrometry and X-ray photoelectron spectroscopy investigation of B4C barrier thickness effects at the Mo-on-Si interface in Mo/Si multilayers
Shanghai Institute of Optics and Fine MechanicsUniversity of Chinese Academy of SciencesUniversity of Science and Technology of ChinaNational Synchrotron Radiation Laboratory
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Boosting blister formation on EUV masks by hydrogen and water vapor
Abstract: Blister formation on extreme ultraviolet (EUV) masks by EUV-induced plasma irradiation is a problem that causes patterning errors. We investigated the blister formation under EUV-induced plasma containing hydrogen and water vapor through an accelerated mask lifetime…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Effect of annealing on laser-induced damage of ZrO2/SiO2 and Nb2O5/Sc2O3/SiO2 multilayer mirrors with and without metal sublayer
Ioffe InstituteSt Petersburg UniversityFrumkin Institute of Physical Chemistry and Electrochemistry Russian Academy of SciencesResearch Institute of Scientific Research and Production Association
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Interference-governed electromagnetic-thermal coupling and heat transport in pulse EUV-irradiated multilayer nanofilms
Mo-Si multilayer mirrors are central to extreme ultraviolet lithography, where nanoscale optical interference and heat accumulation together constrain reflectivity and operational stability. Here we develop an analytical electromagnetic-thermal coupling model that directly links…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedPDF
- Structural and Thermal Stability of B4C/Ru Multilayers with Carbon Barrier Layers
The chemical interaction between Mo and Ru layers in multilayer structures depending on the thickness ratio ($Γ$) was carried out using X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and X-ray reflectometry (XRR). The results showed significant interaction of…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedPDF
- Hyper NA EUV lithography: an imaging perspective
BackgroundTo print ever smaller features at high contrast projection lithography technology has evolved to shorter wavelength light and larger numerical aperture (NA). After enabling the extreme-ultraviolet (EUV) wavelength, the industry is looking into increasing the NA. At NA’s…
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Development of Neutron Interferometer using Multilayer Mirrors and Measurements of Neutron-Nuclear Scattering Length with Pulsed Neutron Source
This study entailed the successful deployment of a novel neutron interferometer that utilizes multilayer mirrors. The apparatus facilitates a precise evaluation of the wavelength dependence of interference fringes utilizing a pulsed neutron source. Our interferometer achieved an…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedDOIPDF
- A Mo/Si multilayer film based selective thermal emitter for high-temperature infrared stealth application
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- Morphology control in Ni/Ti multilayer neutron mirrors by ion-assisted interface engineering and B 4 C incorporation
The optical contrast and minimum layer thickness of Ni/Ti broadband neutron multilayer supermirrors is usually hampered by an interface width, typically 0.7 nm, caused by nanocrystallites, interdiffusion, and/or intermixing. We explore the elimination of nanocrystallites in…
Linköping UniversityThinfilm (Sweden)Institute for Materials Research, Tohoku University
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- High-speed and wide-field nanoscale table-top ptychographic EUV imaging and beam characterization with a sCMOS detector
We present high-speed and wide-field EUV ptychography at 13.5 nm wavelength using a table-top high-order harmonic source. Compared to previous measurements, the total measurement time is significantly reduced by up to a factor of five by employing a scientific complementary metal…
GSI Helmholtz Centre for Heavy Ion ResearchFriedrich Schiller University JenaFraunhofer Institute for Applied Optics and Precision Engineering
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOI
- High-fluence and high-gain multilayer focusing optics to enhance spatial resolution in femtosecond X-ray laser imaging
Abstract With the emergence of X-ray free-electron lasers (XFELs), coherent diffractive imaging (CDI) has acquired a capability for single-particle imaging (SPI) of non-crystalline objects under non-cryogenic conditions. However, the single-shot spatial resolution is limited to…
SPring-8Japan Synchrotron Radiation Research InstituteHokkaido UniversityInstitute of Biological Chemistry, Academia Sinica
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDF
- Double-multilayer monochromators for high-energy and large-field X-ray imaging applications with intense pink beams at SPring-8 BL20B2
In this study, double-multilayer monochromators that generate intense, high-energy, pink X-ray beams are designed, installed and evaluated at the SPring-8 medium-length (215 m) bending-magnet beamline BL20B2 for imaging applications. Two pairs of W/B 4 C multilayer mirrors are…
SPring-8Japan Synchrotron Radiation Research Institute
Fundamental research · No laboratory or pilot wording.From OpenAlex · not yet reviewedDOIPDF
- DarpanX: A Python Package for Modeling X-ray Reflectivity of Multilayer Mirrors
Multilayer X-ray mirrors consist of a coating of a large number of alternate layers of high Z and low Z materials with a typical thickness of 10-100 Angstrom, on a suitable substrate. Such coatings play an important role in enhancing the reflectivity of X-ray mirrors by allowing…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedDOIPDF
- Photosensitivity and reflectivity of the active layer in Tamm plasmon polariton based organic solar cell
The paper proposes a model of an organic solar cell based on Tamm plasmon polariton localized at the boundary of the active layer doped with plasmon nanoparticles and a multilayer mirror. It is shown that the integral absorption in the active layer can be increased by 10%…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedDOIPDF
- The refined EUV mask model
A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facilitate accurate simulations of EUV mask performance for high-NA EUV photo-lithography (EUVL) imaging…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedPDF
- Sticking behavior and transformation of tin droplets on silicon wafers and multilayer-coated mirrors
Silicon wafer and multilayer-coated mirror samples were exposed to impact of drops of molten tin to examine the adhesion behavior and cleaning possibilities. The sticking of tin droplets to horizontal substrates was examined for different surface conditions in a high vacuum…
Fundamental research · No laboratory or pilot wording.From arXiv · not yet reviewedDOIPDF