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Equipment & consumables · Germany

Trumpf

Private Work there, own it, buy from it ↓

EUV plasma-source lasers — holds How this is computedCount of bottlenecks on which this organisation is recorded as a producer, a holder of the capacity, or a supplier of a critical part.Method →Code → of the How this is computedCount of rows in the bottleneck corpus: every material plus every non-material chokepoint.Method →Code → bottlenecks tracked here.

Bottlenecks held1 (Computed: Count of bottlenecks on which this organisation is recorded as a producer, a holder of the capacity, or a supplier of a critical part.) of 33each with another maker recordedHardest binding12 (Estimate by Substrata, 2026-09-15: concentration 3 + substitution 3 + lead time 3 + inelasticity 3 = 12 of 12)/12EUV lithography scanners · judged 2026-09-15Directory gradeChokepointa judgement, not a sourced factEvents0 (Computed: Accepted events that name this organisation, plus (counted separately) accepted events on a bottleneck it holds that do not name it.)name it · 1 more on what it holds

Why graded so · The drive laser is as single-sourced as the scanner it sits inside.

Role cited from trumpf.com ↗. The grade is this project’s judgement. Report an error

Searching is free and needs no AI. Summaries use your own AI model.

01Chokepoints it holds

1 of 1 sourced
  • EUV lithography scanners

    Supplies a critical part · Binding now

    Supplies into ASML NL

    Sourced: trumpf.com ↗

    Estimate, not a measurementconcentration 3 + substitution 3 + lead time 3 + inelasticity 3 = 12 of 12. One maker, a backlog in the tens of billions of euros, no second source in progress. The definition of a chokepoint.By Substrata · 2026-09-15Supporting source →/123+3+3+3

Score = concentration + substitution + lead time + inelasticity, each 0–3, an analyst judgement dated 2026-09-15; open a score for its rationale and assessment. Makers are those the corpus records, not the whole market. No market-share figure is sourced, so none is shown.

02What has happened

1 about what it holds

About what it holds, not naming Trumpf

All events →

03Unread leads

6 found by the sweep, unread

Pages the sweep found on these chokepoints. Nobody here has read them yet; they are not events and not evidence.

04What could loosen its grip

about its chokepoints, not the company
  • Nanoimprint lithography

    Printing chip patterns by pressing a patterned mask into resist like a stamp, instead of projecting an image through lenses and mirrors.

    Science · for EUV lithography scanners

    readiness
    Estimate, not a measurementPrototype at meaningful scale. Canon commercialised the FPA-1200NZ2C in October 2023 and shipped one to the Texas Institute for Electronics in 2024, at 14 nm minimum linewidth — equivalent to a 5 nm node. That is a real machine doing real patterning, but not volume logic production: throughput, defectivity and the supply of 1:1 imprint masks are the open questions, and a stamp touching the wafer fails differently from light.By Substrata · 2026-09-18Supporting source →/9

Readiness is the 1–9 technology-readiness scale, a dated judgement; open a figure for the reasoning and its source.

05Others at the same step of the chain

directory rows · grades are judgements

06Ways to take part

how to reach it, not whether to

Not investment advice. This says how the public can reach a company — a job, its shares, its products — not whether anyone should. It takes no account of anyone’s circumstances, and a company holding a chokepoint is not a reason to own it. What this is not

Work there
It publishes its roles on its own careers page.Official careers page ↗
Own part of it
Its shares are not traded on a public exchange. Family-owned.
Buy from it
What it does in the chain: EUV plasma-source lasers. At this depth of the chain most sales are to other businesses, under contract. Its own page describes what it offers.Its own page ↗

07Hiring

official careers page

Its roles are published on its own site, which Substrata links rather than reads. Official careers page ↗

08What this holds up

1 loop
  • Siliconone turn: Months

    makes EUV lithography scanners, which gates it.

    Worst judgement on this loop: How this is computedThe highest severity score among the bottlenecks recorded as gates on the loop.Method →Code →, judged 2026-09-15 · this join is sourced

A loop is one design, build and measure turn. Severity is a dated judgement on a 0–12 scale, not a measurement, and the judgements are not added together — the figure shown is the worst single one.

09Sources

1 cited
  1. trumpf.com ↗ — its role in the chain: EUV plasma-source lasers; EUV lithography scanners: supplies a critical part

Discussion

Comments use threadkit (permission is participation). Sign in with OrangeCat to write. Fact-check is the same assistant as Ask, grounded in the corpus.

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