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Ruthenium, sputtering and ALD grade

A rare metal being adopted for the wiring inside advanced chips. It comes out of the ground only alongside platinum.

The bottleneck itself →

  1. Research21 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
  2. Lab1 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
  3. Pilot0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
  4. Early0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)
  5. Scale0 (Computed: Items per stage = papers, preprints and grants collected for the bottleneck whose relevance score is 2 or more, placed on a stage by the rule in lib/science.ts; judgements are counted separately.)

judged, with a citation claimed, no citationNumber: papers, preprints and grants the feeds collected — unreviewed

Searched for “ruthenium interconnect”, “ruthenium atomic layer deposition”, “Ru interconnect” in titles and abstracts.

22 collected items, newest first ↓Who is active ↓

All stagesFundamental researchApplied / labPilot / demonstrationEarly commercialAt scaleNewestMost cited

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