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EUV lithography scanners

The machines that print the finest circuit patterns. One company on earth builds them.

The bottleneck itself →

Searched for “EUV lithography”, “extreme ultraviolet lithography”, “EUV scanner”, “EUV source” in titles and abstracts.

4 collected items, newest first ↓Judged by hand ↓Who is active ↓

All stagesFundamental researchApplied / labPilot / demonstrationEarly commercialAt scaleNewestMost cited

Pilot / demonstration — readiness 5 to 7 of the nine-point scale. Evidence it takes: A pilot line, field trial or demonstration announced by the organisation running it; a demonstration or SBIR Phase II grant.

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Readiness and substitute status, with reasoning
  • TechnologyPilot / demonstrationreadiness Estimate, not a measurementCanon commercialised the FPA-1200NZ2C in October 2023 and shipped one to the Texas Institute for Electronics in 2024, at 14 nm minimum linewidth — equivalent to a 5 nm node. That is a real machine doing real patterning, but not volume logic production: throughput, defectivity and the supply of 1:1 imprint masks are the open questions, and a stamp touching the wafer fails differently from light.By Substrata, open to challenge · 2026-09-18Supporting source →Judgement, cited · 2026-09-18

    Nanoimprint lithography

    Canon commercialised the FPA-1200NZ2C in October 2023 and shipped one to the Texas Institute for Electronics in 2024, at 14 nm minimum linewidth — equivalent to a 5 nm node. That is a real machine doing real patterning, but not volume logic production: throughput, defectivity and the supply of 1:1 imprint masks are the open questions, and a stamp touching the wafer fails differently from light.

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