Scenarios
What if it fails?
Pick a scenario on the record, or build your own from a company (private ones included), a bottleneck or a country. You get what it hits, what lies downstream, which listed companies are exposed, and what the record says about recovery — one recorded step at a time (rule).
ASML cannot ship
Why this is a live question: ASML plans to ship more than 60 EUV scanners in 2026, high-NA and low-NA together, on memory demand. (2026-04-15)
/scenarios?at=company:asml
Step one · How this is computedDirect hits: bottlenecks where the failed node is a maker, a part supplier or the location. Makers wholly inside it are lost; makers also operating elsewhere are partly affected; the rest remain. Downstream: every bottleneck that needs a hit one, transitively, through recorded rows. Exposed: holders of hit and downstream bottlenecks and companies a filing says need or sell into them.Method →Code → bottleneck hit directly
| Bottleneck | Result | Makers lost | Partly in it | Makers remaining | Parts lost |
|---|---|---|---|---|---|
| EUV lithography scanners | No recorded maker left | ASML | none | none | none |
Step two · How this is computedDirect hits: bottlenecks where the failed node is a maker, a part supplier or the location. Makers wholly inside it are lost; makers also operating elsewhere are partly affected; the rest remain. Downstream: every bottleneck that needs a hit one, transitively, through recorded rows. Exposed: holders of hit and downstream bottlenecks and companies a filing says need or sell into them.Method →Code → downstream through recorded inputs
EUV lithography scanners → Leading-edge foundry capacity
An input to Leading-edge foundry capacity is disrupted. Whether it stops depends on inventory and substitution the corpus does not record.
Evidence for each step
- Leading-edge foundry capacity needs EUV lithography scanners
EUV technology enables TSMC to keep driving chip scaling as the shorter wavelength of EUV light is better able to print the nanometer-scale features of advanced technology designs.
Primary source
- Leading-edge foundry capacity needs EUV lithography scanners
EUV lithography scanners → Leading-edge foundry capacity → Advanced packaging capacity
An input to Advanced packaging capacity is disrupted. Whether it stops depends on inventory and substitution the corpus does not record.
Evidence for each step
- Leading-edge foundry capacity needs EUV lithography scanners
EUV technology enables TSMC to keep driving chip scaling as the shorter wavelength of EUV light is better able to print the nanometer-scale features of advanced technology designs.
Primary source - Advanced packaging capacity needs Leading-edge foundry capacity
so that various chiplets such as SoC and and high bandwidth memory (HBM) can be placed on it
Primary source · TSMC’s 2022 annual report on the CoWoS interposer. The SoC dies are the logic side.
- Leading-edge foundry capacity needs EUV lithography scanners
Step three · How this is computedDirect hits: bottlenecks where the failed node is a maker, a part supplier or the location. Makers wholly inside it are lost; makers also operating elsewhere are partly affected; the rest remain. Downstream: every bottleneck that needs a hit one, transitively, through recorded rows. Exposed: holders of hit and downstream bottlenecks and companies a filing says need or sell into them.Method →Code → companies exposed, How this is computedOrganisations recorded on a bottleneck (maker, capacity holder or part supplier) whose shares, or a parent’s, trade on an exchange found in the SEC ticker file or OpenFIGI.Method →Code → with a listing
Exposure is a recorded relation, not a size, and not a direction: a remaining maker may gain as much as a dependent loses.
| Company | Listing | How it is exposed |
|---|---|---|
| ASML | ASML NA | The failed node · EUV lithography scanners |
| Carl Zeiss SMT | Private | Part supplier to a hit bottleneck · EUV lithography scanners |
| Trumpf | Private | Part supplier to a hit bottleneck · EUV lithography scanners |
| Intel Foundry | INTC USvia Intel | Holds a downstream bottleneck · Leading-edge foundry capacity |
| Samsung Foundry | 005930 KSvia Samsung Electronics | Holds a downstream bottleneck · Leading-edge foundry capacity |
| TSMC | 2330 TT | Holds a downstream bottleneck · Leading-edge foundry capacity |
| TSMC Advanced Packaging | 2330 TTvia TSMC | Holds a downstream bottleneck · Advanced packaging capacity |
| Amazon Web Services | AMZN USvia Amazon | Needs it (sourced) · Leading-edge foundry capacity source |
| AMD | AMD US | Needs it (sourced) · Leading-edge foundry capacity source |
| Broadcom | AVGO US | Needs it (sourced) · Leading-edge foundry capacity source |
| CoreWeave | CRWV US | Needs it (sourced) · Leading-edge foundry capacity source |
| Marvell | MRVL US | Needs it (sourced) · Leading-edge foundry capacity source |
| Microsoft | MSFT US | Needs it (sourced) · Leading-edge foundry capacity source |
| NVIDIA | NVDA US | Needs it (sourced) · Leading-edge foundry capacity sourceNeeds it (sourced) · Advanced packaging capacity source |
| Applied Materials | AMAT US | Sells into it (sourced) · Leading-edge foundry capacity source |
| ASM International | ASM NA | Sells into it (sourced) · Leading-edge foundry capacity source |
| Canon | 7751 JP | Sells into it (sourced) · Advanced packaging capacity source |
| KLA | KLAC US | Sells into it (sourced) · Leading-edge foundry capacity sourceSells into it (sourced) · Advanced packaging capacity source |
| Lam Research | LRCX US | Sells into it (sourced) · Leading-edge foundry capacity source |
| Tokyo Electron | 8035 JP | Sells into it (sourced) · Leading-edge foundry capacity sourceSells into it (sourced) · Advanced packaging capacity source |
Step four · what the record says about recovery
No recovery date is computed: the corpus holds no measured lead-time series. What it holds is shown with its basis.
- EUV lithography scanners
- Lead-time test
- Estimate by Substrata, open to challenge, 2026-09-15: One maker, a backlog in the tens of billions of euros, no second source in progress. The definition of a chokepoint.Estimate, not a measurementOne maker, a backlog in the tens of billions of euros, no second source in progress. The definition of a chokepoint.By Substrata, open to challenge · 2026-09-15 — decision to new capacity, a judged score in the assessment
- Relief time at this stage
- Estimate by Substrata, open to challenge, 2026-09-15: Order-of-magnitude time from a decision to relief at this stage of the loop. Illustrative: chosen by hand, not taken from a measured lead-time dataset.Estimate, not a measurementOrder-of-magnitude time from a decision to relief at this stage of the loop. Illustrative: chosen by hand, not taken from a measured lead-time dataset.By Substrata, open to challenge · 2026-09-15 (Compute, order of magnitude)
Try another scenario
On the record
- China halts gallium exports
- China halts rare-earth metal and magnet exports
- Taiwan is cut off
- Carl Zeiss SMT goes offline
- ASML cannot ship
- Ukraine’s neon goes offline again
- Qatar’s helium stops
- Japanese photoresist supply stops
- The Quartz Corp closes
- Korea’s HBM lines stop